This Etch Ring, also known as Focus Ring or Edge Ring, is fabricated from pure CVD solid SiC, designed for use in plasma etching processes such as RIE and ICP. It offers exceptional plasma resistance, ultra-low metallic contamination, and precise flatness to enhance etch uniformity and reduce particle defects in semiconductor fabs.
Key Selling Points
Ultra-Low Metal Impurity < 5 ppb – Minimizes metal contamination risk for high-yield semiconductor fabrication.
Plasma Erosion Rate < 2 nm/min – Extended service life under aggressive fluorine/chlorine plasma, reducing downtime.
Flatness Tolerance ≤ 10 μm – Ensures uniform plasma distribution and consistent etch results across the wafer.
Pure CVD Solid SiC Material – High mechanical strength and thermal resistance for reliable performance.
Technical Specifications
Material Base
Pure CVD Solid SiC or High-Purity Silicon Single Crystal
Plasma Erosion Rate
< 2 nm/min (under high-density CF4/O2 plasma)
Flatness Tolerance
≤ 10 μm
Total Metal Purity
< 5 ppb
Models and Options
Available in configurations for various plasma etcher platforms. Please contact us for specific model compatibility and custom sizing.
Materials and Structure
Manufactured from pure CVD solid SiC or high-purity silicon single crystal, offering excellent thermal and mechanical properties. The ring is precisely machined to meet tight dimensional tolerances, ensuring a secure fit and optimal performance.
Applications
This Etch Ring is specifically designed for use in Inductively Coupled Plasma (ICP) etchers and Reactive Ion Etching (RIE) systems for semiconductor device manufacturing. It protects chamber components, controls plasma distribution, and improves etching uniformity.
Customization
We offer customization services to meet specific requirements including dimensions, materials, and surface finish. OEM/ODM projects are welcome.
FAQ
What is the MOQ for this etch ring?
MOQ is 1 unit, allowing you to trial multiple configurations if needed.
What are the delivery incoterms?
We support EXW, FCA, DAP, and DDP delivery methods for your convenience.
What payment terms are available?
New customers: 100% T/T in advance. Long-term cooperation customers: 70% T/T in advance, 30% before shipment.
How do you ensure product quality?
We perform pre-shipment testing on all products, and our manufacturing processes are ISO9001, ISO14001, and ISO45001 certified.
Which etcher models is this ring compatible with?
Compatible with most ICP and RIE systems. Please provide your equipment model for verification.
Can you provide custom materials or sizes?
Yes, we offer customization. Please share your specifications for a quote.
What is the lead time for production?
Lead time varies based on order quantity and customization. Please contact us for details.
Do you provide samples?
We can provide samples for evaluation. Please contact us for sample availability.
Inquiry Information
For more details or to request a quote, please contact:
Name: Frank
Email: sales05@semi-cera.com
Tel: +86 15957878134
WhatsApp: +86 15957878134
Address: Ningbo, China
Image Filename: cvd-sic-etch-ring.jpg Alt Text: CVD SiC etching ring for plasma etcher, high purity and flatness
