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High-Purity 1-(Chloromethyl)-2-Vinylbenzene for Photoresist Applications

в наличии:
SKU: 6741928081
модель: JM 22570-84-9

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High-Purity 1-(Chloromethyl)-2-Vinylbenzene for Photoresist Applications

url-slug: high-purity-1-chloromethyl-2-vinylbenzene-photoresist

Product Summary: This high-purity grade of 1-(chloromethyl)-2-vinylbenzene (CAS 22570-84-9) is specifically engineered for synthesizing high-performance negative photoresist resins, including E-beam photoresists, and advanced packaging dielectric materials. With ppb-level metal impurity control and production in GMP cleanrooms, it meets the stringent requirements of semiconductor and electronic material manufacturing.

Key Selling Points

  • Photoresist-grade purity: Metal impurities <10 ppb, meeting SEMI Grade 4 standards, ensuring reliability in advanced lithography processes.
  • Precision synthesis: Microchannel continuous flow technology enables high-purity production and batch-to-batch consistency.
  • Cleanroom production: Manufactured in GMP cleanrooms with rigorous control of particles and metal ions, ideal for semiconductor applications.
  • Proven performance: Helped clients pass verification by top-tier Korean wafer fabs and achieve mass production for 193nm immersion lithography.
  • Rapid sampling: Process optimization and first validation sample delivery completed within 2 weeks.

Technical Specifications

Product Name1-(chloromethyl)-2-vinylbenzene
CAS22570-84-9
Molecular FormulaC9H9Cl
Molecular Weight152.62
EINECS245-092-5
Boiling Point223.4±9.0 °C (Predicted)
Density1.066±0.06 g/cm³ (Predicted)
AppearanceLight yellow to colorless liquid

Models and Options

Available in standard electronic grade packaging. Custom isomer ratios and high-purity grades can be developed per client requirements.

Materials and Structure

The product is a chloromethylated styrene derivative with a vinyl group and chloromethyl group, enabling polymerization and further functionalization. It is moisture-sensitive and must be stored in a dry, sealed environment under inert gas.

Applications

Ideal for synthesizing negative photoresist resins (E-beam), advanced packaging dielectric materials, and homogeneous ion-exchange membranes. Also used in ultra-pure water resins and chelating resins.

Customization

Custom isomer ratio development, high-purity variants, and CDMO process development are available. From lab route optimization to industrial scale-up.

Case Study

Leading international semiconductor material company: Achieved mass production for 193nm immersion lithography photoresist with metal impurities <10 ppb, passing verification by a top-tier Korean wafer fab. Annual supply of 5 tons.

FAQ

  • What is the minimum order quantity? MOQ is 1 kg.
  • How is the product shipped? Sea freight, air freight, or international express (DHL/FedEx/UPS) depending on order size and urgency.
  • What quality control measures are in place? Each batch undergoes full testing including GC/HPLC purity, moisture, and metal content. COA provided. Third-party inspection (SGS/BV) available.
  • What is the typical lead time? Sample orders 3-5 days via express; bulk orders 15-35 days by sea.
  • Can you provide custom isomer ratios? Yes, custom o/m/p isomer ratios can be developed per your formulation needs.

Inquiry Information

Contact our sales team for pricing, samples, and technical support:

  • Email: sales@jumingchem.com
  • Phone/WhatsApp: +86 159 6162 4309
  • Website: https://en.jmchemchina.com/

Images

Main image: 1-(chloromethyl)-2-vinylbenzene product bottle (photobank-1)

Additional images: molecular structure and packaging (photobank-42, photobank-49)